Automatic calibration of lithography simulation parameters

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 380-395

  Jug, S ^a   Huang, R ^a   Byers, J ^a   Mack, C ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Auto tune; Lithography simulation; Model calibration; PROLITH

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DATA STRUCTURES; PARAMETER ESTIMATION; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR DEVICE MANUFACTURE;

LITHOGRAPHY SIMULATORS;

PHOTOLITHOGRAPHY;

EID: 0034839897     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425230     Document Type: Conference Paper

References (7)

1. Lithography model tuning: Matching simulation to experiment
2. Process-specific tuning of lithography simulation tools
3. Matching simulation and experiment for chemically amplified resists
4. Modeling the impact of thermal history during post exposure bake on the lithographic performance of chemically amplified resists
5. Lithographic optimization using photoresist contrast