Matching simulation and experiment for chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 183-192

  Mack, Chris A ^a   Ercken, Monique ^a   Moelants, Myriam ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MATHEMATICAL MODELS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; POST-EXPOSURE BAKE (PEB);

PHOTORESISTS;

EID: 0032648453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354330     Document Type: Conference Paper

References (6)