Fullerite C60 as electron-beam resist for 'dry' nanolithography

Microelectronic Engineering

Volumn 69, Issue 2-4, 2003, Pages 429-434

  Shnitov, V V ^a   Mikoushkin, V M ^a   Gordeev, Yu S ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

Amorphous carbon; Electron structure; Electron beam resist; Electron induced transformation; Fullerite C60; Nanolithography

Indexed keywords

ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON IRRADIATION; FULLERENES; HEAT TREATMENT; NANOTECHNOLOGY; PLASMA ETCHING;

ELECTRON BEAM RESIST;

MICROELECTRONIC PROCESSING;

EID: 0141456727     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00331-9     Document Type: Conference Paper

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