Interaction of chlorine radicals with polyethylene and hydrocarbon thin films under vacuum conditions - A comparison with atomic oxygen reactivity

Surface Science

Volumn 543, Issue 1-3, 2003, Pages 75-86

  Torres, Jessica ^a   Perry, C C ^a   Wagner, A J ^a   Fairbrother, D Howard ^a  

^a JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

Chlorine; Oxygen; Self assembly; Surface chemical reaction

Indexed keywords

CHLORINE; CROSSLINKING; OXYGEN; THIN FILMS; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC OXYGEN REACTIVITY;

SURFACE REACTIONS;

EID: 0043285302     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00992-0     Document Type: Article

References (33)

1. Garbassi F., Morra M., Occhiello E. Polymer Surfaces from Physics to Technology. Revised and Updated Edition:1998;John Wiley and Sons, Chichester.
2. Bergbreiter D.E. Prog. Polym. Sci. 19:1994;529.
3. Cahn M.-C., Ko T.-M., Hiraoka H. Surf. Sci. Rep. 24:1996;1.
4. Nakagawa T., Yamada S. J. Appl. Pol. Sci. 16:1972;1997.
5. Csernica J., Rhodes D.B. J. Polym. Eng. 19:1999;1.
6. Jung M.Y., Choi S.S., Kim J.W., Kim D.W. Surf. Sci. 482-485:2001;1119.
7. Eddy C.R.J., Leonhardt D., Douglass S.R., Thoms B.D., Shamamian V.A., Butler J.E. J. Vac. Sci. Technol. A. 17:1999;38.
8. Coburn J.W., Winters H.F. J. Appl. Phys. 50:1979;3189.
9. Kim J.H., Woo S.I. Appl. Surf. Sci. 156:2000;9.
10. Ricard A. Reactive Plasmas. 1996;Socite Francaise du Vide, Paris.
11. Kondow M., Uomi K., Hosomi K., Mozume T. Jpn. J. Appl. Phys. 33:1994;L1056.
12. Ikeda H., Matsushita D., Naito S., Ohmori K., Sakai A., Zaima S., Yasuda Y. Jpn. J. Appl. Phys. 41:2002;2463.
13. Chu C.J., D'Evelyn M.P., Hauge R.H., Margrave J.L. J. Appl. Phys. 70:1991;1695.
14. Duan H.L., Zaharias G.A., Bent S.F. Thin Solid Films. 395:2001;36.
15. Cross E.M., McCarthy T.J. Macromolecules. 25:1992;2603.
16. Levitskii M.B., Kuryatnikov Y.I., Dzhagatspanyan R.V. Khim. Vysok. Energ. 20:1986;159.
17. Elman J.F., Gerenser L.J., Goppert-Berarducci K.E., Pochan J.M. Macromolecules. 23:1990;3922.
18. Balamurugan S., Mandale A.B., Badrinarayanan S., Vernekar S.P. Polymer. 42:2001;2501.
19. Linford M.R., Chidsey C.E.D. Langmuir. 18:2002;6217.
20. Torres J., Perry C.C., Bransfield S.J., Fairbrother D.H. J. Phys. Chem. B. 106:2002;6265.
21. The Handbook of X-ray Photoelectron Spectroscopy, Perkin Elmer Corporation, 1979.
22. IBM Corporation, Chemical Kinetics Simulator, Available from < http://www.almaden.ibm.com/st/computational_science/ck/msim/>, 1996.
23. Gillespie D.T. Comput. Phys. 22:1976;403.
24. Gillespie D.T. J. Phys. Chem. 81:1977;2340.
25. Wagner A.J., Carlo S., Vecitis C., Fairbrother D.H. Langmuir. 18:2002;1542.
26. Wagner A.J., Han K., Vaught A.L., Fairbrother D.H. J. Phys. Chem. B. 104:2000;3291.
27. Wirde M., Gelius U., Dunbar T., Allara D.L. Nucl. Instrum. Methods Phys. Res. 131:1997;245.
28. Carlo S.R., Wagner A., Fairbrother D.H. J. Phys. Chem. B. 104:2000;6633.
29. Vancso G.J., Allston T.D., Chun I., Johansson L.-S., Liu G., Smith P.F. Int. J. Polym. Anal. Character. 3:1996;89.
30. Garton D.J., Minton T.K., Alagia M., Balucani N., Casavecchia P., Volpi G.G. J. Chem. Phys. 112:2000;5975.
31. Kluth G.J., Sung M.M., Maboudian R. Langmuir. 13:1997;6491.
32. Qin X., Tzvetkov T., Jacobs D.C. Nucl. Instrum. Methods B. 203:2003;130.
33. Robinson G.N., Freedman A. Langmuir. 11:1995;2600.