Achieving optimal cycle time improvement in a 300-mm semiconductor fab using dynamic simulation and design of experiments

Simulation

Volumn 79, Issue 3, 2003, Pages 171-179

  Mercier, Dominique ^a   Bonnin, Olivier ^a   Vialletelle, Philippe ^a  

^a STMICROELECTRONICS   (France)

Author keywords

Cycle time; DOE; Semiconductor; Simulation; Single wafer batch

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; DATABASE SYSTEMS; ELECTRONICS INDUSTRY; INVESTMENTS; MICROPROCESSOR CHIPS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

DESIGN OF EXPERIMENT; DISCRETE EVENT SIMULATION; OPTIMAL CYCLE TIME; RETURN ON NET ASSETS;

COMPUTER SIMULATION;

EID: 0042913180     PISSN: 00375497     EISSN: None     Source Type: Journal    
DOI: 10.1177/0037549703256040     Document Type: Article

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