Analysis of a 200/300mm vertical furnace with integrated metrology

Solid State Technology

Volumn 44, Issue 4, 2001, Pages

  Claasen Vujcic, T ^a   Hasper, A ^a   Abraham, M ^a  

^a ASM International NV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; EQUIPMENT TESTING; FURNACES; OPTIMIZATION; RADIATION COUNTERS;

INTEGRATED METROLOGY; OVERALL EQUIPMENT EFFECTIVENESS;

SEMICONDUCTOR DEVICE TESTING;

EID: 0035311885     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. The urgent need for integrated metrology
2. Thin film process monitoring in 300mm vertical furnaces by integrated metrology
3. Characterizing a CVD-integrated metrology system
4. Closer control of 300mm manufacturing equipment by integration of new sensors for wet etch, film thickness, and CD control
5. Analyzing the furnace area: How cycle time and cost of ownership are influenced by equipment type and scheduling strategy