Electron beam lithography over topography

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 53-56

  Bauch, L ^a   Jagdhold, U ^a   Bottcher M ^a  

^a Inst F Halbleiterphysik Frankfurt   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIZING; PHOTORESISTS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACES;

ELECTRON BEAM IMAGING; PLANARIZATION; SPIN COATING; TOPOGRAPHY; VOLTAGE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029732779     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00193-X     Document Type: Article

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3. H. Bethe, "Zur Theorie des Durchganges schneller Korpuskularstrahlen durch Materie", Ann. Phys. 5(5), 325, (1930)
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5. Y.-H. Lee, R. Browning, N. Maluf, G. Owens, and R. F. W. Pease, J. Vac. Sci. Technol. B 10 (6), 3094 (1992)