Experiment and simulation of e-beam direct-writing over topography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2723, Issue , 1996, Pages 339-347

  Jagdhold, U ^a   Bauch, L ^a   Bottcher M ^a  

^a Institut fur HF(Oder) GmbH   (Germany)

Author keywords

e beam lithography; Monte Carlo simulation; PMMA; Topography; Wet development

Indexed keywords

ALGORITHMS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; MONTE CARLO METHODS;

TOPOGRAPHICAL SURFACES;

ELECTRON BEAMS;

EID: 0030316349     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240486     Document Type: Conference Paper

References (7)

1. Zur theorie des durchganges schneller korpuskularstrahlen durch materie