Characterizing CaF2 for VUV optical components: Roughness, surface scatter, and bulk scatter

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4932, Issue , 2003, Pages 444-451

  Hultåker, Annette ^a   Benkert, Nils ^a   Gliech, Stefan ^a   Duparré, Angela ^a  

^a NONE

Author keywords

157 nm; 193 nm; Atomic Force Microscopy; CaF2; Light scattering; Optical coatings; VUV

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT POLARIZATION; LIGHT SCATTERING; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

VACUUM-ULTRAVIOLET (VUV);

FLUORSPAR;

EID: 0042862976     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472392     Document Type: Conference Paper

References (5)

1. S. Gliech, J. Steinert, A. Duparré, "Light scattering measurements of optical thin-film components at 157 and 192 nm", Applied Optics, 41, 3224-3235, 2002
2. Stefan Gliech, Henning Geßner, Angela Duparré, "System for angle resolved and total light scattering, transmittance and reflectance measurement at 157 nm and 193 nm", Proc SPIE LBOC 7 / Boulder Damage Symposium, 16-19 September 2002, Proceedings SPIE Vol. 4932, in print, 2002
3. A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, and J.M. Bennett, "Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components", Applied Optics, 41, 154-171, 2002
4. C.K. Carnigila, "Scalar scattering theory for multiplayer optical coatings", Opt. Eng. 18, 104-115 (1979)
5. A. Duparré, "Light scattering of thin dielectric films", in Thin Films for Optical Coatings, R.E. Hummel and K.H. Guenther, eds., vol. 1 of Handbook of Optical Properties Series, pp. 273-304 (CRC, Boca Raton, FL, 1995)