System for angle resolved and total light scattering, transmittance and reflectance measurements of optical components at 157 nm and 193 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4932, Issue , 2003, Pages 452-457

  Gliech, Stefan ^a   Geßner, Henning ^a   Duparré, Angela ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

157 nm; 193 nm; Angle resolved scattering; Light scattering; Optical components; Reflectance; Total scattering; Transmittance; VUV

Indexed keywords

LASER BEAMS; LIGHT REFLECTION; LIGHT TRANSMISSION; LITHOGRAPHY;

VACUUM-ULTRAVIOLET (VUV);

LIGHT SCATTERING;

EID: 0042862974     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472395     Document Type: Conference Paper

References (2)

1. S. Gliech, J. Seinert, A. Duparré, "Light-scattering measurements on optical thin-film components at 157 nm and 193 nm", Applied Optics 41, 3224-3235 (2002)
2. 2 for VUV optical components: roughness, surface scatter, and bulk scatter", LBOC 7 / Boulder Damage Symposium, 16-19 September 2002, Proceedings SPIE Vol. 4932, in print