High voltage atomic force microscopy: A new technology for nanoscale optical devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5118, Issue , 2003, Pages 213-220

  Rosenwaks, Yossi ^a   Molotskii, Michel ^a   Agronin, Alex ^a   Urenski, Pavel ^a   Rosenman, Gil ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALS; DIFFRACTION GRATINGS; ELECTRIC BREAKDOWN; ELECTRIC FIELD EFFECTS; ELECTROMAGNETIC WAVE PROPAGATION; FERROELECTRIC MATERIALS; FREE ENERGY; LIGHT POLARIZATION; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

DOMAIN GRATINGS; FERROELECTRIC CRYSTALS; FERROELECTRIC SURFACE; HIGH VOLTAGE ATOMIC FORCE MICROSCOPY;

OPTICAL DEVICES;

EID: 0042829344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.498327     Document Type: Conference Paper

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