메뉴 건너뛰기




Volumn 43, Issue 9-11, 2003, Pages 1483-1488

A new method for the analysis of high-resolution SILC data

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC POTENTIAL; ELECTRON TRAPS; GATES (TRANSISTOR); SILICA;

EID: 0042694468     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(03)00263-4     Document Type: Conference Paper
Times cited : (1)

References (10)
  • 1
    • 0033319253 scopus 로고    scopus 로고
    • Degradation and breakdown in thin oxide layers: Mechanisms, models and reliability prediction
    • Degraeve R., Kaczer B. and Groeseneken G., "Degradation and breakdown in thin oxide layers: mechanisms, models and reliability prediction", Microelectronics Reliability, Vol. 39, 1999, pp. 1445-1460.
    • (1999) Microelectronics Reliability , vol.39 , pp. 1445-1460
    • Degraeve, R.1    Kaczer, B.2    Groeseneken, G.3
  • 3
    • 0032275853 scopus 로고    scopus 로고
    • Reliability projection for Ultra-Thin Oxides at Low Voltage
    • Stathis J. H., D. J. DiMaria, "Reliability projection for Ultra-Thin Oxides at Low Voltage" IEDM Tech. Dig., 1998, pp. 167-170.
    • (1998) IEDM Tech. Dig. , pp. 167-170
    • Stathis, J.H.1    DiMaria, D.J.2
  • 4
    • 0042467946 scopus 로고    scopus 로고
    • In-situ method patented by the LUC and IMEC, No. PCT/EP90/00291, April 19, 1990
    • In-situ method patented by the LUC and IMEC, No. PCT/EP90/00291, April 19, 1990.
  • 7
    • 33751518209 scopus 로고
    • Least structure solution of photonuclear yield functions
    • Cook B. C. "Least structure solution of photonuclear yield functions", Nuclear Instruments and Methods, Vol. 24, 1963, pp. 256-268.
    • (1963) Nuclear Instruments and Methods , vol.24 , pp. 256-268
    • Cook, B.C.1
  • 9
    • 21544458715 scopus 로고
    • Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon
    • DiMaria D. J., Cartier E. and Arnold D. "Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon", J. Appl. Phys., Vol. 73, 1993, pp. 3367-3384.
    • (1993) J. Appl. Phys. , vol.73 , pp. 3367-3384
    • DiMaria, D.J.1    Cartier, E.2    Arnold, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.