A study of Al2O3:C films on Si(100) grown by low pressure MOCVD

Materials Research Society Symposium - Proceedings

Volumn 747, Issue , 2003, Pages 159-164

  Singh, M P ^a   Thakur, C S ^a   Bhat, N ^a   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CURRENT VOLTAGE CHARACTERISTICS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CHARGE TRAPPING;

FILM GROWTH;

EID: 0042664142     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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