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Applied Physics A: Materials Science and Processing

Volumn 77, Issue 3-4, 2003, Pages 367-370

Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties

(4) Xiao, K a Liu, Y a Yu, G a Zhu, D a

a INSTITUTE OF CHEMISTRY (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FIELD EFFECT TRANSISTORS; MOLECULAR ORIENTATION; MORPHOLOGY; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COPPER PHTHALOCYANINE; SUBSTRATE TEMPERATURE;

COPPER COMPOUNDS;

EID: 0042658341 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-003-2169-6 Document Type: Article

Times cited : (118)

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