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Journal of Electron Spectroscopy and Related Phenomena

Volumn 88-91, Issue , 1998, Pages 603-607

Resonant Auger electron spectroscopy for analysis of the chemical state of phosphorus segregated at SiO2/Si interfaces

(8) Oshima, M a Yoshimura, Y a Ono, K a Fujioka, H a Sato, Y b Baba, Y c Yoshii, K c Sasaki, T A c

a UNIVERSITY OF TOKYO (Japan)

b NTT CORPORATION (Japan)

c JAPAN ATOMIC ENERGY AGENCY (Japan)

Author keywords

Auger electron spectroscopy; Phosphorus; SiO2 Si interfaces

Indexed keywords

EID: 0042639301 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/s0368-2048(97)00169-2 Document Type: Article

Times cited : (5)

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