Phosphorus pileup and sublimation at the silicon surface

Journal of the Electrochemical Society

Volumn 144, Issue 7, 1997, Pages 2548-2551

  Sato, Y ^a   Imai, K ^a   Yabumoto, N ^b,c  

^a NTT CORPORATION   (Japan)

^b NTT Advance Technology Corporation   (Japan)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ETCHING; HYDROFLUORIC ACID; ION IMPLANTATION; NITROGEN; PHOSPHORUS; SUBLIMATION;

PIRANHA CLEANED WAFERS;

SILICON WAFERS;

EID: 0031188652     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837853     Document Type: Article

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