Application of a focused ion beam system to nanolithography

Materials Research Society Symposium - Proceedings

Volumn 739, Issue , 2002, Pages 65-70

  Langford, Richard M ^a   O'Reilly, Shamus ^a   McEwen, Iain J ^b  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b HERIOT WATT UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOMERS; FABRICATION; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; PRINTING;

FOCUSED ION BEAM (FIB) SYSTEMS;

ION BEAMS;

EID: 0042622412     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-739-h7.2     Document Type: Conference Paper

References (8)

1. H. A. Biebuyck, N. B. Larson, E. Delamarche and B. Micheal, IBM J. Res. Dev. 42, 159 (1997).
2. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo and L. Zhang, J. Vac. Sci. Technol. B 15, 2897 (1997).
3. L. A. Giannuzzi, J. L. Drown, S. R. Brown, R. B. Irwin and F. A. Stevie in Specimen Preparation for Transmission Electron Microscopy of Materials IV, edited by R.M.Anderson and S.D.Walck, (Mat. Res. Soc. Proc. 480, 1997) pp. 19.
4. G. Pan, S. Takahashi, J. F. Walker, D. J. Mapps, K. Yamakawa, N. Honda and K. Ouchi, J. Magn. and Magn. Mater. 202, 583 (1999).
5. A. Orth, J. P Reithmaier, J. Muller, A. Kieslich, A. Forchel, J. Weber, I. Gyuro and E. Zielinski, Microelectron. Eng., 27, 347 (1995).
6. M. J. Vasilie, R. Nassar and J. J. Xie, Vac. Sci. Technol.B 16, 2499 (1998).
7. R. M. Langford and A. K. Petford-Long, J. Vac. Sci. Technol. A 19, 2186 (2001).
8. R. M. Langford, B. J. Inkson, G. Moebus and J. M. Titchmarsh, Inst. Phys. Conf. Ser. 168, 135 (2000).