UV laser micromachining of silicon, indium phosphide and lithium niobate for telecommunications applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4876, Issue 1, 2002, Pages 479-486

  Greuters, Jako ^a   Rizvi, Nadeem ^a  

^a Exitech Ltd   (United Kingdom)

Author keywords

Indium phosphide; Laser micromachining; Lithium niobate; Optical chips

Indexed keywords

ETCHING; EXCIMER LASERS; MICROMACHINING; TELECOMMUNICATION SYSTEMS;

OPTICAL CHIPS;

LASER BEAM EFFECTS;

EID: 0042230914     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.463653     Document Type: Conference Paper

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