Recent advanced applications of AAS and ICP-MS in the semiconductor industry

Materials Science and Engineering: B

Volumn 102, Issue 1-3, 2003, Pages 238-246

  Shabani, Mohammad B ^a   Shiina, Y ^a   Kirscht, F G ^b   Shimanuki, Y ^a  

^a SUMCO CORPORATION   (Japan)

^b Mitsubishi Silicon America   (United States)

Author keywords

Direct acid bulk decomposition; Drop etching; Drop sandwich etching; Graphite furnace atomic absorption spectroscopy; Inductively coupled plasma mass spectrometry; Room temperature acid vapor phase decomposition; Vapor phase decomposition

Indexed keywords

DECOMPOSITION; ETCHING; GRAPHITE; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; SILICA; SOLUTIONS;

VAPOR PHASE DECOMPOSITION (VPD);

SEMICONDUCTOR MATERIALS;

EID: 0041930988     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00739-0     Document Type: Conference Paper

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