-
1
-
-
0348056529
-
-
(a) Singer, P. Semicond. Intl. 1997, 20 (No. 13, November), 67-70.
-
(1997)
Semicond. Intl.
, vol.20
, Issue.13 NOVEMBER
, pp. 67-70
-
-
Singer, P.1
-
2
-
-
0042538887
-
-
IBM Corp., East Fishkill, NY, September
-
(b) "IBM introduces advanced chip technology", IBM Corp., East Fishkill, NY, September 1997 (http://www.chips.ibm.com/news/cmos7s.html).
-
(1997)
IBM Introduces Advanced Chip Technology
-
-
-
4
-
-
33751390885
-
-
Kumar, R.; Fronczek, F. R.; Maverick, A. W.; Lai, W. G.; Griffin, G. L. Chem. Mater. 1992, 4, 577-582
-
(1992)
Chem. Mater.
, vol.4
, pp. 577-582
-
-
Kumar, R.1
Fronczek, F.R.2
Maverick, A.W.3
Lai, W.G.4
Griffin, G.L.5
-
5
-
-
21544482550
-
-
Reynolds, S. K.; Smart, C. J.; Baran, E. F.; Baum, T. H.; Larson, C. E.; Brock, P. J. Appl. Phys. Lett. 1991, 59, 2332-2334. Jain, A.; Chi, K.-M.; Hampden-Smith, M. J.; Kodas, T. T.; Farr, J. D.; Paffett, M. F. J. Mater. Res. 1992, 7, 261-264.
-
(1991)
Appl. Phys. Lett.
, vol.59
, pp. 2332-2334
-
-
Reynolds, S.K.1
Smart, C.J.2
Baran, E.F.3
Baum, T.H.4
Larson, C.E.5
Brock, P.J.6
-
6
-
-
0026822237
-
-
Reynolds, S. K.; Smart, C. J.; Baran, E. F.; Baum, T. H.; Larson, C. E.; Brock, P. J. Appl. Phys. Lett. 1991, 59, 2332-2334. Jain, A.; Chi, K.-M.; Hampden-Smith, M. J.; Kodas, T. T.; Farr, J. D.; Paffett, M. F. J. Mater. Res. 1992, 7, 261-264.
-
(1992)
J. Mater. Res.
, vol.7
, pp. 261-264
-
-
Jain, A.1
Chi, K.-M.2
Hampden-Smith, M.J.3
Kodas, T.T.4
Farr, J.D.5
Paffett, M.F.6
-
7
-
-
0001358596
-
-
and references therein
-
Doppelt, P.; Baum, T. H.; Ricard, L. Inorg. Chem. 1996, 35, 1286-1291; and references therein.
-
(1996)
Inorg. Chem.
, vol.35
, pp. 1286-1291
-
-
Doppelt, P.1
Baum, T.H.2
Ricard, L.3
-
8
-
-
0027590071
-
-
Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K. J. Phys. (Paris) IV, 1991, 1 (Coll. C2), 271. Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K.; Dubois, L. H. Mater. Sci. Eng. 1993, B17, 87-92. Jain, A.; Chi, K.-M.; Kodas, T. T.; Hampden-Smith, M. J. J. Electrochem. Soc. 1993, 140, 1434-1439.
-
(1991)
J. Phys. (Paris) IV
, vol.1
, Issue.COLL. C2
, pp. 271
-
-
Norman, J.A.T.1
Muratore, B.A.2
Dyer, P.N.3
Roberts, D.A.4
Hochberg, A.K.5
-
9
-
-
0027542486
-
-
Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K. J. Phys. (Paris) IV, 1991, 1 (Coll. C2), 271. Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K.; Dubois, L. H. Mater. Sci. Eng. 1993, B17, 87-92. Jain, A.; Chi, K.-M.; Kodas, T. T.; Hampden-Smith, M. J. J. Electrochem. Soc. 1993, 140, 1434-1439.
-
(1993)
Mater. Sci. Eng.
, vol.B17
, pp. 87-92
-
-
Norman, J.A.T.1
Muratore, B.A.2
Dyer, P.N.3
Roberts, D.A.4
Hochberg, A.K.5
Dubois, L.H.6
-
10
-
-
0027590071
-
-
Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K. J. Phys. (Paris) IV, 1991, 1 (Coll. C2), 271. Norman, J. A. T.; Muratore, B. A.; Dyer, P. N.; Roberts, D. A.; Hochberg, A. K.; Dubois, L. H. Mater. Sci. Eng. 1993, B17, 87-92. Jain, A.; Chi, K.-M.; Kodas, T. T.; Hampden-Smith, M. J. J. Electrochem. Soc. 1993, 140, 1434-1439.
-
(1993)
J. Electrochem. Soc.
, vol.140
, pp. 1434-1439
-
-
Jain, A.1
Chi, K.-M.2
Kodas, T.T.3
Hampden-Smith, M.J.4
-
11
-
-
0031210998
-
-
Nguyen, T.; Chameski, L. J.; Hsu, S. T. J. Electrochem. Soc. 1997, 144, 2829-2833.
-
(1997)
J. Electrochem. Soc.
, vol.144
, pp. 2829-2833
-
-
Nguyen, T.1
Chameski, L.J.2
Hsu, S.T.3
-
15
-
-
4243427738
-
-
Nozari, M. S.; Drago, R. S. Inorg. Chem. 1972, 11, 280-283. McMillin, D. R.; Drago, R. S.; Nusz, J. A. J. Am. Chem. Soc. 1976, 98, 3120-3126.
-
(1972)
Inorg. Chem.
, vol.11
, pp. 280-283
-
-
Nozari, M.S.1
Drago, R.S.2
-
16
-
-
0011822018
-
-
Nozari, M. S.; Drago, R. S. Inorg. Chem. 1972, 11, 280-283. McMillin, D. R.; Drago, R. S.; Nusz, J. A. J. Am. Chem. Soc. 1976, 98, 3120-3126.
-
(1976)
J. Am. Chem. Soc.
, vol.98
, pp. 3120-3126
-
-
McMillin, D.R.1
Drago, R.S.2
Nusz, J.A.3
-
18
-
-
0007793031
-
-
Houle, F. A.; Wilson, R. J.; Baum, T. H. J. Vac. Sci. Technol. A 1986, 4, 2452-2458.
-
(1986)
J. Vac. Sci. Technol. A
, vol.4
, pp. 2452-2458
-
-
Houle, F.A.1
Wilson, R.J.2
Baum, T.H.3
-
21
-
-
0027659267
-
-
Rana, V. V. S.; Joshi, R. V.; Ohdomari, I., Eds.; Materials Research Society: Pittsburgh, PA
-
Awaya, N.; Arita, Y. In: Advanced Metalization for ULSI Applications in 1991, Rana, V. V. S.; Joshi, R. V.; Ohdomari, I., Eds.; Materials Research Society: Pittsburgh, PA, 1992; p. 345. Awaya, N.; Arita, N. Jpn. J. Appl. Phys. (1) 1993, 32, 3915-3919.
-
(1992)
Advanced Metalization for ULSI Applications in 1991
, pp. 345
-
-
Awaya, N.1
Arita, Y.2
-
22
-
-
0027659267
-
-
Awaya, N.; Arita, Y. In: Advanced Metalization for ULSI Applications in 1991, Rana, V. V. S.; Joshi, R. V.; Ohdomari, I., Eds.; Materials Research Society: Pittsburgh, PA, 1992; p. 345. Awaya, N.; Arita, N. Jpn. J. Appl. Phys. (1) 1993, 32, 3915-3919.
-
(1993)
Jpn. J. Appl. Phys. (1)
, vol.32
, pp. 3915-3919
-
-
Awaya, N.1
Arita, N.2
-
23
-
-
0042038039
-
-
Smith, G. C.; Blumenthal, R., Eds.; Materials Research Society: Pittsburgh, PA
-
Cho, C.-C. In: Tungsten and Other Advanced Metals for ULSI Applications in 1990; Smith, G. C.; Blumenthal, R., Eds.; Materials Research Society: Pittsburgh, PA, 1991; p. 189. Cho, C.-C. U. S. Patent 5,087,485 (1992).
-
(1991)
Tungsten and Other Advanced Metals for ULSI Applications in 1990
, pp. 189
-
-
Cho, C.-C.1
-
24
-
-
0043039663
-
-
U. S. Patent 5,087,485 (1992)
-
Cho, C.-C. In: Tungsten and Other Advanced Metals for ULSI Applications in 1990; Smith, G. C.; Blumenthal, R., Eds.; Materials Research Society: Pittsburgh, PA, 1991; p. 189. Cho, C.-C. U. S. Patent 5,087,485 (1992).
-
-
-
Cho, C.-C.1
-
25
-
-
36448998860
-
-
Zheng, B.; Eisenbraun, E. T.; Liu, J.; Kaloyeros, A. E. Appl. Phys. Lett. 1992, 67, 2175.
-
(1992)
Appl. Phys. Lett.
, vol.67
, pp. 2175
-
-
Zheng, B.1
Eisenbraun, E.T.2
Liu, J.3
Kaloyeros, A.E.4
-
26
-
-
0012486539
-
-
Pilkington, R. D.; Jones, P. A.; Ahmed, W.; Tomlinson, R. D.; Hill, A. E.; Smith, J. J.; Nuttall, R. J. Phys. (Paris) IV, 1991, 1 (Coll. C2), 263-269.
-
(1991)
J. Phys. (Paris) IV
, vol.1
, Issue.COLL. C2
, pp. 263-269
-
-
Pilkington, R.D.1
Jones, P.A.2
Ahmed, W.3
Tomlinson, R.D.4
Hill, A.E.5
Smith, J.J.6
Nuttall, R.7
-
27
-
-
0026259584
-
-
(a) Lai, W. G.; Xie, Y.; Griffin, G. L. J. Electrochem. Soc. 1991, 138, 3499-3504.
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 3499-3504
-
-
Lai, W.G.1
Xie, Y.2
Griffin, G.L.3
-
28
-
-
0029323366
-
-
(b) Wang, J.; Little, R. B.; Lai, W. G.; Griffin, G. L. Thin Solid Films 1995, 262, 31-38.
-
(1995)
Thin Solid Films
, vol.262
, pp. 31-38
-
-
Wang, J.1
Little, R.B.2
Lai, W.G.3
Griffin, G.L.4
-
29
-
-
0031677830
-
-
The mechanism presented by these authors, shown here in somewhat simplified form, also included the inhibiting effect of added hfacH on the reaction
-
(c) Borgharkar, N. S.; Griffin, G. L. J. Electrochem. Soc. 1998, 145, 347-352. The mechanism presented by these authors, shown here in somewhat simplified form, also included the inhibiting effect of added hfacH on the reaction.
-
(1998)
J. Electrochem. Soc.
, vol.145
, pp. 347-352
-
-
Borgharkar, N.S.1
Griffin, G.L.2
-
30
-
-
0001505134
-
-
(a) Dissociative adsorption of alcohols on Cu: Bowker, M.; Madix, R. J. Surf. Sci. 1980, 95, 190-206. Russell, J. N., Jr.; Gates, S. M.; Yates, J. T., Jr. Surf. Sci. 1985, 163, 516-540.
-
(1980)
Surf. Sci.
, vol.95
, pp. 190-206
-
-
Bowker, M.1
Madix, R.J.2
-
31
-
-
0000961491
-
-
(a) Dissociative adsorption of alcohols on Cu: Bowker, M.; Madix, R. J. Surf. Sci. 1980, 95, 190-206. Russell, J. N., Jr.; Gates, S. M.; Yates, J. T., Jr. Surf. Sci. 1985, 163, 516-540.
-
(1985)
Surf. Sci.
, vol.163
, pp. 516-540
-
-
Russell J.N., Jr.1
Gates, S.M.2
Yates J.T., Jr.3
-
32
-
-
0000185812
-
-
(b) Dehydrogenation of i-PrOH over Cu: Cunningham, J.; Al-Sayyed, G. H.; Cronin, J. A.; Fierro, J. L. G.; Healy, C.; Hirschwald, W.; Ilyas, M.; Tobin, J. P. J. Catal. 1986, 102, 160-171.
-
(1986)
J. Catal.
, vol.102
, pp. 160-171
-
-
Cunningham, J.1
Al-Sayyed, G.H.2
Cronin, J.A.3
Fierro, J.L.G.4
Healy, C.5
Hirschwald, W.6
Ilyas, M.7
Tobin, J.P.8
-
33
-
-
0029327113
-
-
(c) Generation of carbonyl compounds from alcohols in plasmas: Kaloyeros, A. E.; Zheng, B.; Lou, I.; Lau, J.; Hellgeth, J. W. Thin Solid Films, 1995, 262, 20-30.
-
(1995)
Thin Solid Films
, vol.262
, pp. 20-30
-
-
Kaloyeros, A.E.1
Zheng, B.2
Lou, I.3
Lau, J.4
Hellgeth, J.W.5
-
34
-
-
0003972370
-
Neutral thermochemical data
-
Mallard, W. G.; Linstrom, P. J., Eds. August National Institute of Standards and Technology, Gaithersburg MD 20899
-
Afeefy, H. Y.; Liebman, J. F.; Stein, S. E. "Neutral Thermochemical Data"; In: NIST Standard Reference Database Number 69; Mallard, W. G.; Linstrom, P. J., Eds. August 1997, National Institute of Standards and Technology, Gaithersburg MD 20899 (http://webbook.nist.gov).
-
(1997)
NIST Standard Reference Database
, vol.69
-
-
Afeefy, H.Y.1
Liebman, J.F.2
Stein, S.E.3
-
35
-
-
0003998388
-
-
CRC Press: Boca Raton, FL, and references therein
-
Lide, D. R., Ed.; CRC Handbook of Chemistry and Physics; 77th Ed.; CRC Press: Boca Raton, FL, 1996; and references therein. Some values in these tables are based on enthalpies of combustion and vaporization in: Weast, R. C., Ed.; CRC Handbook of Chemistry and Physics; 62nd Ed.; CRC Press: Boca Raton, FL, 1981.
-
(1996)
CRC Handbook of Chemistry and Physics; 77th Ed.
-
-
Lide, D.R.1
-
36
-
-
0003998388
-
-
CRC Press: Boca Raton, FL
-
Lide, D. R., Ed.; CRC Handbook of Chemistry and Physics; 77th Ed.; CRC Press: Boca Raton, FL, 1996; and references therein. Some values in these tables are based on enthalpies of combustion and vaporization in: Weast, R. C., Ed.; CRC Handbook of Chemistry and Physics; 62nd Ed.; CRC Press: Boca Raton, FL, 1981.
-
(1981)
CRC Handbook of Chemistry and Physics; 62nd Ed.
-
-
Weast, R.C.1
-
38
-
-
0000065379
-
Acid-base behaviour
-
Covington, A. K; Dickinson, T., Eds.; Plenum: London, Ch. 3
-
King, E. J. "Acid-base behaviour"; In: Physical Chemistry of Organic Solvent Systems; Covington, A. K; Dickinson, T., Eds.; Plenum: London, 1973; Ch. 3.
-
(1973)
Physical Chemistry of Organic Solvent Systems
-
-
King, E.J.1
-
39
-
-
0004052732
-
Proton affinity evaluation
-
Mallard, W. G.; Linstrom, P. J., Eds. August National Institute of Standards and Technology, Gaithersburg MD 20899
-
Hunter, E. P.; Lias, S. G. "Proton Affinity Evaluation"; In: NIST Standard Reference Database Number 69; Mallard, W. G.; Linstrom, P. J., Eds. August 1997, National Institute of Standards and Technology, Gaithersburg MD 20899 (http://webbook.nist.gov).
-
(1997)
NIST Standard Reference Database
, vol.69
-
-
Hunter, E.P.1
Lias, S.G.2
-
40
-
-
0042538880
-
-
Ellwanger, R.; Wang, S.-Q., Eds. Materials Research Society: Pittsburgh, PA
-
Griffin, G. L.; Borgharkar, N. S.; Maverick, A. W.; Fan, H. In: Advanced Metalization and Interconnect Systems for ULSI Applications in 1995; Ellwanger, R.; Wang, S.-Q., Eds. Materials Research Society: Pittsburgh, PA, 1996; pp 195-199.
-
(1996)
Advanced Metalization and Interconnect Systems for ULSI Applications in 1995
, pp. 195-199
-
-
Griffin, G.L.1
Borgharkar, N.S.2
Maverick, A.W.3
Fan, H.4
-
41
-
-
0000409362
-
-
Chiang, C-M.; Miller, T. M.; Dubois, L. H. J. Phys. Chem. 1993, 97, 11781-11786.
-
(1993)
J. Phys. Chem.
, vol.97
, pp. 11781-11786
-
-
Chiang, C.-M.1
Miller, T.M.2
Dubois, L.H.3
-
42
-
-
0001224208
-
-
Pinkas, J.; Huffman, J. C.; Chisholm, M. H.; Caulton, K. G. Inorg. Chem. 1995, 34, 5314-5318.
-
(1995)
Inorg. Chem.
, vol.34
, pp. 5314-5318
-
-
Pinkas, J.1
Huffman, J.C.2
Chisholm, M.H.3
Caulton, K.G.4
-
43
-
-
0000393766
-
-
Pinkas, J.; Huffman, J. C.; Bollinger, J. C.; Streib, W. E.; Baxter, D. V.; Chisholm, M. H.; Caulton, K. G. Inorg. Chem. 1997, 36, 2930-2937.
-
(1997)
Inorg. Chem.
, vol.36
, pp. 2930-2937
-
-
Pinkas, J.1
Huffman, J.C.2
Bollinger, J.C.3
Streib, W.E.4
Baxter, D.V.5
Chisholm, M.H.6
Caulton, K.G.7
-
45
-
-
0000583694
-
-
Wiberg, K. B.; Nakaji, D. Y.; Morgan, K. M. J. Am. Chem. Soc. 1993, 115, 3527-3532.
-
(1993)
J. Am. Chem. Soc.
, vol.115
, pp. 3527-3532
-
-
Wiberg, K.B.1
Nakaji, D.Y.2
Morgan, K.M.3
-
46
-
-
84980149401
-
-
Häfelinger, G.; Steinmann, L. Angew. Chem. Int. Ed. Engl. 1977, 16, 47-48. Jackman, L. M.; Packham, D. I. Proc. Chem. Soc. 1957, 349-350.
-
(1977)
Angew. Chem. Int. Ed. Engl.
, vol.16
, pp. 47-48
-
-
Häfelinger, G.1
Steinmann, L.2
-
47
-
-
37049048572
-
-
Häfelinger, G.; Steinmann, L. Angew. Chem. Int. Ed. Engl. 1977, 16, 47-48. Jackman, L. M.; Packham, D. I. Proc. Chem. Soc. 1957, 349-350.
-
(1957)
Proc. Chem. Soc.
, pp. 349-350
-
-
Jackman, L.M.1
Packham, D.I.2
-
48
-
-
0043039655
-
-
Bublik, Zh. N.; Volkov, S. V.; Mazurenko, E. A. Russ. J. Inorg. Chem. 1984, 29, 73-76.
-
(1984)
Russ. J. Inorg. Chem.
, vol.29
, pp. 73-76
-
-
Bublik, Zh.N.1
Volkov, S.V.2
Mazurenko, E.A.3
-
50
-
-
0028699207
-
-
Kondoh, E. Kawano, Y.; Takeyasu, N.; Ohta, T. J. Electrochem. Soc. 1994, 141, 3494-3499.
-
(1994)
J. Electrochem. Soc.
, vol.141
, pp. 3494-3499
-
-
Kondoh, E.1
Kawano, Y.2
Takeyasu, N.3
Ohta, T.4
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