Radio frequency glow discharge optical emission spectroscopy: Depth profiling analysis of thin anodic alumina films as potential reference materials

Spectroscopy (Santa Monica)

Volumn 17, Issue 10, 2002, Pages 14-23

  Shimizu, K ^a   Habazaki, H ^b   Skeldon, P ^c   Thompson, G E ^c   Marcus, R Kenneth ^d  

^a KEIO UNIVERSITY   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

^c UNIVERSITY OF MANCHESTER   (United Kingdom)

^d CLEMSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; BARRIER-TYPE FILMS (BTF); OPTICAL EMISSION SPECTROSCOPY (OES); RADIO FREQUENCY (RF);

ALUMINA; ANODIC OXIDATION; CURRENT DENSITY; ELECTROLYTIC POLISHING; EMISSION SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; GLOW DISCHARGES; INDUCTIVELY COUPLED PLASMA; INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

THIN FILMS;

EID: 0041875121     PISSN: 08876703     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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