-
1
-
-
85024545960
-
Edge-bonded dissimilar orthogonal elastic wedges under normal and shear loading
-
Bogy D.B. Edge-bonded dissimilar orthogonal elastic wedges under normal and shear loading J. Appl. Mech. 35 1968 460-466
-
(1968)
J. Appl. Mech.
, vol.35
, pp. 460-466
-
-
Bogy, D.B.1
-
2
-
-
85008269051
-
Two edge-bonded elastic wedges of different materials and wedge angles under surface tractions
-
Bogy D.B. Two edge-bonded elastic wedges of different materials and wedge angles under surface tractions J. Appl. Mech. 38 1971 377-386
-
(1971)
J. Appl. Mech.
, vol.38
, pp. 377-386
-
-
Bogy, D.B.1
-
3
-
-
0344861750
-
Stress singularities in a two-material wedge
-
Hein V.L. Stress singularities in a two-material wedge Int. J. Fract. Mech. 7 1971 317-330
-
(1971)
Int. J. Fract. Mech.
, vol.7
, pp. 317-330
-
-
Hein, V.L.1
-
6
-
-
0028468445
-
A new procedure for measuring the decohesion energy for thin ductile films on substrates
-
Bagchi A. Lucas G.E. Suo Z. Evans A.G. A new procedure for measuring the decohesion energy for thin ductile films on substrates J. Mater. Res. 9 7 1994 1734-1741
-
(1994)
J. Mater. Res.
, vol.9
, Issue.7
, pp. 1734-1741
-
-
Bagchi, A.1
Lucas, G.E.2
Suo, Z.3
Evans, A.G.4
-
7
-
-
0030231959
-
Measurements of the debond energy for thin metallization lines on dielectrics
-
Bagchi A. Evans A.G. Measurements of the debond energy for thin metallization lines on dielectrics Thin Solid Films 286 1996 203-212
-
(1996)
Thin Solid Films
, vol.286
, pp. 203-212
-
-
Bagchi, A.1
Evans, A.G.2
-
8
-
-
0031246958
-
Investigation of a new fracture mechanics specimen for thin film adhesion measurement
-
de Boer M.P. Kriese M.D. Gerberich W.W. Investigation of a new fracture mechanics specimen for thin film adhesion measurement J. Mater. Res. 12 10 1997 2673-2685
-
(1997)
J. Mater. Res.
, vol.12
, Issue.10
, pp. 2673-2685
-
-
de Boer, M.P.1
Kriese, M.D.2
Gerberich, W.W.3
-
9
-
-
0021522097
-
Measurement of adherence of residually stressed thin films by indentation. I. Mechanics of interface delamination
-
Marshall D.B. Evans A.G. Measurement of adherence of residually stressed thin films by indentation. I. Mechanics of interface delamination J. Appl. Phys. 56 10 1984 2632-2638
-
(1984)
J. Appl. Phys.
, vol.56
, Issue.10
, pp. 2632-2638
-
-
Marshall, D.B.1
Evans, A.G.2
-
10
-
-
0021517474
-
Measurement of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si
-
Rossington C. Evans A.G. Marshall D.B. Khuri-Yakub B.T. Measurement of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si J. Appl. Phys. 56 10 1984 2639-2644
-
(1984)
J. Appl. Phys.
, vol.56
, Issue.10
, pp. 2639-2644
-
-
Rossington, C.1
Evans, A.G.2
Marshall, D.B.3
Khuri-Yakub, B.T.4
-
11
-
-
0032635756
-
Quantitative adhesion measures of multiplayer films: Part I. Indentation mechanics
-
Kriese M.D. Gerberich W.W. Moody N.R. Quantitative adhesion measures of multiplayer films: Part I. Indentation mechanics J. Mater. Res. 14 7 1999 3007-3018
-
(1999)
J. Mater. Res.
, vol.14
, Issue.7
, pp. 3007-3018
-
-
Kriese, M.D.1
Gerberich, W.W.2
Moody, N.R.3
-
12
-
-
0032662620
-
Quantitative adhesion measures of multiplayer films: Part II. Indentation of W/Cu, W/W, Cr/W
-
Kriese M.D. Gerberich W.W. Moody N.R. Quantitative adhesion measures of multiplayer films: Part II. Indentation of W/Cu, W/W, Cr/W J. Mater. Res. 14 7 1999 3019-3026
-
(1999)
J. Mater. Res.
, vol.14
, Issue.7
, pp. 3019-3026
-
-
Kriese, M.D.1
Gerberich, W.W.2
Moody, N.R.3
-
13
-
-
0035269286
-
Fracture toughness of the interface between CVD diamond film and silicon substrate in the relation with methane concentration in the source gas mixture
-
Takahashi H. Kamiya S. Saka M. Abe H. Fracture toughness of the interface between CVD diamond film and silicon substrate in the relation with methane concentration in the source gas mixture Diamond Related Mater. 10 2001 760-764
-
(2001)
Diamond Related Mater.
, vol.10
, pp. 760-764
-
-
Takahashi, H.1
Kamiya, S.2
Saka, M.3
Abe, H.4
-
14
-
-
0037099684
-
Crack initiation at free edge of interface between thin films in advanced LSI
-
Kitamura T. Shibutani T. Ueno T. Crack initiation at free edge of interface between thin films in advanced LSI Engng. Fract. Mech. 69 2002 1289-1299
-
(2002)
Engng. Fract. Mech.
, vol.69
, pp. 1289-1299
-
-
Kitamura, T.1
Shibutani, T.2
Ueno, T.3
-
15
-
-
0036448365
-
Delamination strength of Cu thin film characterized by nanoscale stress field near interface edge
-
in Japanese
-
Kitamura T. Hirakata H. Itsuji T. Delamination strength of Cu thin film characterized by nanoscale stress field near interface edge Trans. Jpn. Soc. Mech. Eng. 68 665 2001 119-125 [in Japanese]
-
(2001)
Trans. Jpn. Soc. Mech. Eng.
, vol.68
, Issue.665
, pp. 119-125
-
-
Kitamura, T.1
Hirakata, H.2
Itsuji, T.3
-
16
-
-
4244078745
-
-
VSP, Netherlands
-
Bottiger J, Chevallier J, Kringhoj P, Schweitz KO. Stresses in thin films. Adhesion aspects of thin films, VSP, Netherlands, vol. 1. 2001. p. 1-16
-
(2001)
Stresses in Thin Films. Adhesion Aspects of Thin Films
, vol.1
, pp. 1-16
-
-
Bottiger, J.1
Chevallier, J.2
Kringhoj, P.3
Schweitz, K.O.4
-
17
-
-
0028767879
-
The intrinsic stress of polycrystalline and epitaxial thin metal films
-
Koch R. The intrinsic stress of polycrystalline and epitaxial thin metal films J. Phys.: Condens. Mat. 6 1994 9519-9550
-
(1994)
J. Phys.Condens. Mat.
, vol.6
, pp. 9519-9550
-
-
Koch, R.1
-
18
-
-
0032045524
-
Evaluation of adhesion strength of Ti films on Si (100) by the internal stress method
-
Kinbara A. Kusano E. Kamiya T. Kondo I. Takenaka O. Evaluation of adhesion strength of Ti films on Si(100) by the internal stress method Thin Solid Films 317 1998 165-168
-
(1998)
Thin Solid Films
, vol.317
, pp. 165-168
-
-
Kinbara, A.1
Kusano, E.2
Kamiya, T.3
Kondo, I.4
Takenaka, O.5
|