Use of a double-paddle oscillator for the study of metallic films at high temperatures

Review of Scientific Instruments

Volumn 74, Issue 7, 2003, Pages 3395-3399

  Rosner P ^a   Samwer, K ^a   Pohl, R O ^a,b   Schneider, S ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; DAMPING; EIGENVALUES AND EIGENFUNCTIONS; ELASTIC MODULI; FRICTION; OSCILLATORS (ELECTRONIC); SILICON; THERMOELASTICITY; THIN FILMS; ULTRAHIGH VACUUM;

DOUBLE-PADDLE OSCILLATORS;

METALLIC FILMS;

EID: 0041765815     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1584087     Document Type: Article

References (19)

1. R. N. Kleiman, G. K. Kaminsky, J. D. Reppy, R. Pindak, and D. J. Bishop, Rev. Sci. Instrum. 56, 2088 (1985).
2. R. N. Kleiman, G. Agnolet, and D. J. Bishop, Phys. Rev. Lett. 59, 2079 (1987).
3. B. E. White, Jr. and R. O. Pohl, Phys. Rev. Lett. 75, 4437 (1995).
4. X. Liu and R. O. Pohl, Phys. Rev. B 58, 9067 (1998).
5. M. Layer, M. Heitz, J. Classen, C. Enss, and S. Hunklinger, J. Low Temp. Phys. 124, 419 (2001).
6. J. Classen, V. Keppens, and S. Hunklinger, Physica B 284-288, 377 (2000).
7. T. H. Metcalf and R. O. Pohl, J. Low Temp. Phys. 122, 545 (2001).
8. C. L. Spiel, R. O. Pohl, and A. T. Zehnder, Rev. Sci. Instrum. 72, 1482 (2001).
9. X. Liu, S. F. Morse, J. F. Vignola, D. M. Photiadis, A. Sarkissian, M. H. Marcus, and B. H. Houston, Appl. Phys. Lett. 78, 1346 (2001).
10. B. H. Houston, D. M. Photiadis, M. H. Marcus, J. A. Bucaro, X. Liu, and J. F. Vignola, Appl. Phys. Lett. 80, 1 (2002).
11. P. Lunkenheimer, U. Schneider, R. Brand, and A. Loidl, Contemp. Phys. 41, 15 (2000).
12. P. Rösner, M. Weiß, S. Schneider, and K. Samwer, J. Non-Cryst. Solids 307-310, 848 (2002).
13. L. Kempen, U. Harms, H. Neuhäuser, D. Scholz, E. Peiner, and A. Schlachetzki, J. Phys. IV 6, 643 (1996).
14. X. Liu, NRL (private communication).
15. A. Regenbrecht, G. von-Minnigerode, and K. Samwer, Z. Phys. B: Condens. Matter 79, 25 (1990).
16. B. Reinker, M. Moske, and K. Samwer, Phys. Rev. B 56, 9887 (1997).
17. S. G. Mayr, M. Moske, and K. Samwer, Phys. Rev. B 60, 16950 (1999).
18. Properties of Silicon, EMIS Datareviews Series No. 4, edited by T. K. Ning (INSPEC, New York, 1988).
19. R. O. Pohl, X. Liu, and E. Thompson, Rev. Mod. Phys. 74, 991 (2002).