Low-energy excitations in amorphous films of silicon and germanium

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 14, 1998, Pages 9067-9081

  Liu, Xiao ^a   Pohl, R ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000912679     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.9067     Document Type: Article

References (85)

1. R. C. Zeller and R. O. Pohl, Phys. Rev. B 4, 2029 (1971).
2. P. W. Anderson, B. I. Halperin, and C. M. Varma, Philos. Mag. 25, 1 (1972).
3. W. A. Phillips, J. Low Temp. Phys. 7, 351 (1972).
4. Amorphous Solids: Low Temperature Properties, edited by W. A. Phillips (Springer-Verlag, Berlin, 1981).
5. H. v. Löhneysen and F. Steglich, Phys. Rev. Lett. 391420 (1977).
6. J. E. Graebner and L. C. Allen, Phys. Rev. Lett. 51, 1566 (1983).
7. J. E. GraebnerL. C. AllenPhys. Rev. B 29, 5626 (1984).
8. C. N. King, W. A. Phillips, and J. P. deNeufville, Phys. Rev. Lett. 32, 538 (1974).
9. H. v. Löhneysen and H. J. Schink, Phys. Rev. Lett. 48, 1121 (1982).
10. R. van den Berg and H. v. Löhneysen, Phys. Rev. Lett. 55, 2463 (1985).
11. M. Mertig, G. Pompe, and E. Hegenbarth, Solid State Commun. 49, 369 (1984).
12. R. van den Berg, H. v. Löhneysen, and H. J. Schink, J. Non-Cryst. Solids 77&78, 1339 (1985).
13. M. v. Haumeder, U. Strom, and S. Hunklinger, Phys. Rev. Lett. 44, 84 (1980).
14. J. Y. Duquesne and G. Bellessa, J. Phys. C 16, L65 (1983).
15. J. Y. DuquesneG. BellessaPhilos. Mag. B 52, 821 (1985).
16. K. L. Bhatia and S. Hunklinger, Solid State Commun. 47, 489 (1983).
17. P. A. Thomas, M. H. Brodsky, D. Kaplan, and D. Lepine, Phys. Rev. B 18, 3059 (1978).
18. B. E. White, Jr. and R. O. Pohl, in Thin Films: Stresses and Mechanical Properties V, edited by S. P. Baker et. al MRS Symposia Proceedings No. 356 (Materials Research Society, Pittsburgh, 1995), p. 567.
19. B. E. White, Jr. and R. O. Pohl, Phys. Rev. Lett. 75, 4437 (1995).
20. X. Liu, B. E. White, Jr., R. O. Pohl, E. Iwanizcko, K. M. Jones, A. H. Mahan, B. N. Nelson, R. S. Crandall, and S. Veprek, Phys. Rev. Lett. 78, 4418 (1997).
21. K. A. Topp and D. G. Cahill, Z. Phys. B 101, 235 (1996).
22. J. F. Berret and M. Meissner, Z. Phys. B 70, 65 (1988).
23. U. Buchenau, M. Prager, W. A. Kamitakahara, H. R. Shanks, and N. Nücker, Europhys. Lett. 6, 695 (1988).
24. P. A. Medwick, B. E. White, Jr., and R. O. Pohl, J. Alloys Compd.270, 1 (1998).
25. H. v. Löhneysen, H. Rüsing, and W. Sander, Z. Phys. B 60, 323 (1985).
26. H. v. Löhneysen, J. Non-Cryst. Solids 59&60, 1087 (1983).
27. J. E. Graebner, B. Golding, L. C. Allen, J. C. Knights, and D. K. Biegelsen, Phys. Rev. B 29, 3744 (1984).
28. K. L. Bhatia, M. v. Haumeder, and S. Hunklinger, Solid State Commun. 37, 943 (1981).
29. K. L. Bhatia, M. v. Haumeder, and S. Hunklinger, Z. Phys. B 44, 155 (1981).
30. X. Liu, E. J. Whang, B. E. White, Jr., and R. O. Pohl (unpublished).
31. G. Simmons and H. Wang, Single Crystal Elastic Constants and Calculated Aggregate Properties: A Handbook (The M.I.T. Press, Cambridge, Massachusetts, 1971).
32. B. E. White, Jr., J. Hessinger, and R. O. Pohl, J. Low Temp. Phys.111, 233 (1998).
33. H. J. McSkimin, J. Appl. Phys. 24, 988 (1953).
34. I. R. Cox-Smith, H. C. Liang, and R. O. Dillon, J. Vac. Sci. Technol. A 3, 674 (1985).
35. D. L. Williamson, S. Roorda, M. Chicoine, R. Tabti, P. A. Stolk, S. Acco, and F. W. Saris, Appl. Phys. Lett. 67, 226 (1995).
36. M. Ohring, The Material Science of Thin Films (Academic, New York, 1992), pp. 79.
37. R. Vacher, H. Sussner, and M. Schmidt, Solid State Commun. 34, 279 (1980).
38. L. R. Testardi and J. J. Hauser, Solid State Commun. 21, 1039 (1977).
39. X. Liu, R. O. Pohl, R. S. Crandall, and K. M. Jones, in Defects and Diffusion in Silicon Processing, edited by S. Coffa et. al MRS Symposia Proceedings No. 469 (Materials Research Society, Pittsburgh, 1997), p. 419.
40. S. I. Tan, B. S. Berry, and B. L. Crowder, Appl. Phys. Lett. 20, 88 (1972).
41. R. A. Street, Hydrogenated Amorphous Silicon (Cambridge University Press, Cambridge, United Kingdom, 1991).
42. R. S. Crandall, Y. S. Tsuo, Y. Xu, A. H. Mahan, and D. L. Williamson, Sol. Cells 30, 15 (1991).
43. A. H. Mahan, J. Carapella, B. P. Nelson, R. S. Crandall, and I. Balberg, J. Appl. Phys. 69, 6728 (1991).
44. P. C. Taylor, in Semiconductors and Semimetals, Vol. 21C, edited by J. I. Pankove (Academic, New York, 1984), pp. 99.
45. Y. Wu, J. T. Stephen, D. X. Han, J. M. Rutland, R. S. Crandall, and A. H. Mahan, Phys. Rev. Lett. 77, 2049 (1996).
46. A. H. Mahan, D. L. Williamson, and T. E. Furtak, in Amorphous and Microcrystalline Silicon Technology-1997, edited by M. Hack et. al MRS Symposia Proceedings No. 467 (Materials Research Society, Pittsburgh, 1997), p. 657.
47. A. Uhlherr and S. R. Elliot, Philos. Mag. B 71, 611 (1995).
48. A. A. Langford, M. L. Fleet, B. P. Nelson, W. A. Lanford, and N. Maley, Phys. Rev. B 45, 13 367 (1992).
49. Z. Remes, M. Vanecek, A. H. Mahan, and R. S. Crandall, Phys. Rev. B 56, R12 710 (1997).
50. G. L. Olson and J. A. Roth, Mater. Sci. Rep. 3, 1 (1988).
51. H. J. Stein, F. L. Vook, and J. A. Borders, Appl. Phys. Lett. 14, 328 (1969).
52. X. Liu, R. O. Pohl, S. Asher, and R. S. Crandall, J. Non-Cryst. Solids227-230, 407 (1998).
53. A. K. Raychaudhuri and R. O. Pohl, Solid State Commun. 37, 103 (1980).
54. Solid State Commun.A. K. RaychaudhuriR. O. Pohl44, 711 (1982).
55. X. Liu, H. v. Löhneysen, G. Weiss, and J. Arndt, Z. Phys. B 99, 49 (1995).
56. G. Weiss, A. Daum, M. Sohn, and J. Arndt, Physica B 219&220, 290 (1996).
57. P. Esquinazi and J. Luzuriaga, Phys. Rev. B 37, 7819 (1988).
58. D. Tielburger, R. Merz, R. Ehrenfels, and S. Hunklinger, Phys. Rev. B 45, 2750 (1992).
59. G. Bellessa, Phys. Rev. Lett. 40, 1456 (1978).
60. B. E. White, Jr. and R. O. Pohl, Z. Phys. B 100, 401 (1996).
61. N. F. Mott and E. A. Davis, Electronic Processes in Non-Crystalline Materials, 2nd ed. (Clarendon, Cambridge, England, 1979).
62. S. J. Hudgens, Phys. Rev. B 14, 1547 (1976).
63. B. Movaghar, L. Schweitzer, and H. Overhof, Philos. Mag. B 37, 683 (1978).
64. T. H. Metcalf et. al (unpublished).
65. J. C. Phillips, J. Non-Cryst. Solids 34, 153 (1979).
66. M. F. Thorpe, J. Non-Cryst. Solids 57, 355 (1983).
67. X. Feng, W. J. Bresser, and P. Boolchand, Phys. Rev. Lett. 78, 4422 (1997), and references therein.
68. O. Brand and H. v. Löhneysen, Europhys. Lett. 16, 455 (1991).
69. X. Liu and H. v. Löhneysen, Phys. Rev. B 48, 13 486 (1993).
70. R. Biswas, A. M. Bouchard, W. A. Kamitakahara, G. S. Grest, and C. M. Soukoulis, Phys. Rev. Lett. 60, 2280 (1988).
71. P. A. Fedders and D. A. Drabold, Phys. Rev. B 53, 3841 (1996).
72. J. M. Gibson and M. M. J. Treacy, Phys. Rev. Lett. 78, 1074 (1997).
73. S. Roorda, W. C. Sinke, J. M. Poate, D. C. Jacobson, S. Dierker, B. S. Dennis, D. J. Eaglesham, F. Spaepen, and P. Fuoss, Phys. Rev. B 44, 3702 (1991), and references therein.
74. J. Fortner and J. S. Lannin, Phys. Rev. B 37, 10 154 (1988).
75. R. R. De Avillez, L. A. Clevenger, and C. V. Thompson, J. Mater. Res. 4, 1057 (1989).
76. J. C. Fan and C. Anderson, J. Appl. Phys. 52, 4003 (1981).
77. P. Viscor, J. Non-Cryst. Solids 101, 170 (1988).
78. P. Paduschek, Ch. Hopfl, and H. Mitlehner, Thin Solid Films 110, 291 (1983).
79. J. Y. Duquesne and G. Bellessa, Europhys. Lett. 9, 453 (1989).
80. K. Tanaka, Phys. Rev. B 39, 1270 (1989).
81. S. K. Watson, Phys. Rev. Lett. 75, 1965 (1995).
82. R. Kühn and U. Horstmann, Phys. Rev. Lett. 78, 4067 (1997).
83. R. S. Crandall, X. Liu, and E. Iwanizcko, J. Non-Cryst. Solids227-230, 23 (1998).
84. A. H. Mahan and M. Vanecek, in Amorphous Silicon Materials and Solar Cells, edited by B. L. Stafford (AIP, New York, 1991), p. 195.
85. M. Venecek and A. H. Mahan, J. Non-Cryst. Solids 190, 163 (1995).