Annealing of Quench-Condensed Argon Films

Journal of Low Temperature Physics

Volumn 122, Issue 3-4, 2001, Pages 545-557

  Metcalf, T H ^a   Pohl, R O ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041908382     PISSN: 00222291     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004846127830     Document Type: Article

References (23)

1. Schulze, Wilfried, and Dieter M. Kolb, J. Chem. Soc. Faraday Trans. II, 70, 1098 (1974)
2. Müller, Karl-Heinz, Surf. Sci. 184, L375 (1987).
3. X. W. Zhou, R. A. Johnson, and H. N. G. Wadley, Acta mater. 45, 4441 (1997).
4. Steinmetz, N., H. Menges, and H. v. Löhneysen, Phys. Rev. B 39, 2838 (1989).
5. J. C. M. Li, in Chemistry and Physics of Rapidly Solidified Materials, eds. B. J. Berkowitz and R. O. Scattergood, (The Metallurgical Society of AIME, Warrendale PA, 1983), p. 173.
6. J. B. Wachtman in Mechanical and Thermal Properties of Ceramics, National Bureau of Standards Spec. Publ. #303, 1968.
7. S. K. Dutta, A. K. Mukhopadhyay, and D. Chakraborty, J. Am. Ceram. Soc. 71, 942 (1988).
8. K. K. Phani, S. K. Niyogi, J. Am. Ceram. Soc. 70, C-362 (1987).
9. J. Hessinger and R. O. Pohl, J. Non-Cryst. Solids 208, 151 (1996)
10. K. Bothe, Proc. 5th Int. Conf. Rapidly Quenched Metals, vol. 1, 731 (1985).
11. B. E. White, Jr., J. Hessinger, and R. O. Pohl, J. Low Temp. Phys. 111, 233 (1998)
12. Ch. L. Spiel, R. O. Pohl, A. T. Zehnder Rev. Sci. Inst., in press (2000).
13. J. Hessinger, B. E. White Jr., and R. O. Pohl, Planet. Space Sci. 44, 937 (1996)
14. J. K. Mackenzie, Proc. Phys. Soc. (London) B63, 2 (1950).
15. M. L. Klein and J. A. Venables, Rare Gas Solids, Vol. 1, Academic Press, London, 1976.
16. Chen, H. H., R. A. Aziz, and C. C. Lim, Can. J. Phys 49, 1569 (1971).
17. L. L. Levenson, C. R. Acad. Sci. Paris, B265, 1217 (1967).
18. J. C. Phillips, Rep. Prog. Phys. 59, 1133 (1996).
19. A convenient average value computed from the data in §3.2.3, Table III, of Rare Gas Solids.
20. T. H. Metcalf and R. O. Pohl, Physica B 284-288, 381 (2000).
21. J. Classen, V. Keppens, and S. Hunklinger, Physica B 284-288, 377 (2000).
22. Xiao Liu, R. O. Pohl, and R. S. Crandall, in Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999, eds. H.M. Branz, R.W. Collins, H. Okamoto, S. Guha, R. Schropp, Mat. Res. Soc. Symp. Proc. 557 (1999)
23. B. E. White, Jr., and R. O. Pohl, in Thin Films: Stresses and Mechanical Properties V, S. P. Baker, et al., Eds., Mat. Res. Soc. Symp. Proc. 356, Materials Research Society, Pittsburgh, 1995, p. 567.