Oxygen annealing effect of photoelectron spectra in SrBi2Ta 2O9 film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11 B, 2002, Pages 6797-6802

  Takahashi, Mitsue ^a   Kodama, Kazushi ^a   Noda, Minoru ^a   Hedblom, Patrik ^b   Grishin, Alex ^b   Okuyama, Masanori ^a  

^a OSAKA UNIVERSITY   (Japan)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

Barrier height; O2 annealing; Photoyield; PLD; SBT; XPS

Indexed keywords

ANNEALING; IONIZATION; PULSED LASER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

BARRIER HEIGHT; O2-ANNEALING; PHOTOYIELD; SBT;

THIN FILMS;

EID: 0041676207     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.6797     Document Type: Article

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