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Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 63, Issue 12, 1999, Pages 1576-1583

Formation of Al-Cr-N coatings by dc reactive sputtering

(3) Ide, Yukio a Kishitake, Katsuhiko b Nakamura, Takashi c

a Yamaguchi Prefectural Industrial Technology Institute (Japan)

b KYUSHU INSTITUTE OF TECHNOLOGY (Japan)

c TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; EMISSION SPECTROSCOPY; MASS SPECTROMETRY; OXIDATION RESISTANCE; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM CHROMIUM NITRIDE; ELECTRON MICROPROBE ANALYSIS; REACTIVE SPUTTERING;

PROTECTIVE COATINGS;

EID: 0033320045 PISSN: 00214876 EISSN: None Source Type: Journal
DOI: 10.2320/jinstmet1952.63.12_1576 Document Type: Article

Times cited : (6)

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