Synthesis and characterization of a positive-working, aqueous-base-developable photosensitive polyimide precursor

Journal of Applied Polymer Science

Volumn 86, Issue 2, 2002, Pages 352-358

  Hsu, Steve Lien Chung ^a   Lee, Po I ^a   King, Jinn Shing ^b   Jeng, Jyh Long ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Photoresist; Polyimide; Synthesis

Indexed keywords

AROMATIC POLYMERS; COMPOSITION; ESTERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS TRANSITION; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOSENSITIVITY; POLYMERIZATION; TEMPERATURE; THERMAL EFFECTS; VISCOSITY;

DIAZONAPHTHOQUINONE; PHOTOSENSITIVE POLYIMIDE PRECURSORS; POLYAMIC ESTER BEARING PHENOLIC HYDROXYL GROUPS; TETRAMETHYLAMMONIUM HYDROXIDE; THERMAL IMIDIZATION;

POLYIMIDES;

EID: 0037057394     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.10969     Document Type: Article

References (17)