Novel electron beam lithography technique for submicron T-gate fabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 306-310

  Ahmed, M M ^a   Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039035708     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589311     Document Type: Article

References (19)

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