CAD for silicon anisotropic etching effect of etching products and diffusion

Sensors and Materials

Volumn 10, Issue 7, 1998, Pages 425-433

  Tabata, Osamu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

Anisotropic etching; Diffusion; Etching products; Silicon; Simulation

Indexed keywords

EID: 0040581729     PISSN: 09144935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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