Simulation of three-dimensional etch profile of silicon during orientation dependent anisotropic etching

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 418-423

  Koide, Akira ^a   Tanaka, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ETCHING; SILICON;

ANISOTROPIC CHEMICAL ETCHING;

SINGLE CRYSTALS;

EID: 0030681156     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)