Rapid simulation of silylation and the role of physical mechanisms in profile shapes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 611-624

  Zuniga, Marco A ^a   Croffie, Ebo H ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

REACTION RATES; SWELLING;

CONVERGENCE ACCELERATORS; DIFFUSIVITIES; HIGHLY NONLINEAR; KRYLOV SUBSPACES; LOCAL REACTION RATES; NON-UNIFORM; NUMERICAL - TECHNIQUES; ORDER OF MAGNITUDES; PHYSICAL MECHANISMS; PHYSICAL PARAMETERS; PROFILE SHAPES; RESIST MATRIXES; RESIST SWELLINGS; SIDE WALL ANGLES; SILYLATING AGENTS; SILYLATION; SIMULATION TIME; STRESS DEPENDENTS;

SILANES;

EID: 0040404046     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312366     Document Type: Conference Paper

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