SLITS simulator: Modeling and simulation of e-beam/deep-ultraviolet exposure and silylation

Optical Engineering

Volumn 35, Issue 1, 1996, Pages 277-283

  McDonagh, Declan ^b,d   Arshak, Khalil I ^a,b,d,e,f,g   Arshak, A ^b,d,f   Braddell, J ^a,c,h,i  

^a SPIE ^*

^b UNIVERSITY OF LIMERICK   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d Microlectron Semiconduct Res Grp

^e UNIVERSITY OF BASRAH   (Iraq)

^f UNIVERSITY OF SALFORD   (United Kingdom)

^g BRUNEL UNIVERSITY   (United Kingdom)

^h DUBLIN CITY UNIVERSITY   (Ireland)

ⁱ UNIVERSITY OF THE WEST OF ENGLAND   (United Kingdom)

Author keywords

Dry development; Lithography modeling; Nanolithography; PRIME process; Silylation

Indexed keywords

EID: 0000222589     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.600931     Document Type: Article

References (14)

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