Fowler-Nordheim current injection and write/erase characteristics of metal-oxide-nitride-oxide-Si structure grown with helicon-wave excited plasma processing

Journal of Applied Physics

Volumn 85, Issue 1, 1999, Pages 551-557

  Kimura, Shinjiro ^a   Ikoma, Hideaki ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040153780     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369488     Document Type: Article

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