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Volumn 101, Issue 15, 1997, Pages 2850-2860

Behavior of Si photoelectrodes under high level injection conditions. 3. Transient and steady-state measurements of the quasi-Fermi levels at Si/CH3OH contacts

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0039732490     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp962485c     Document Type: Article
Times cited : (13)

References (31)
  • 1
    • 0003297914 scopus 로고
    • Eyring; H., Henderson, D., Yost, W., Eds.; Academic: New York
    • Gerischer, H. In Physical Chemistry: An Advanced Treatise; Eyring; H., Henderson, D., Yost, W., Eds.; Academic: New York, 1970; Vol. 9A, p 463.
    • (1970) Physical Chemistry: An Advanced Treatise , vol.9 A , pp. 463
    • Gerischer, H.1
  • 10
    • 4143152585 scopus 로고
    • Ph.D. Thesis, California Institute of Technology
    • Ryba, G. N. Ph.D. Thesis, California Institute of Technology, 1992.
    • (1992)
    • Ryba, G.N.1
  • 16
    • 85088619774 scopus 로고    scopus 로고
    • note
    • -3.
  • 20
    • 4143097861 scopus 로고    scopus 로고
    • note
    • The symbol x′ represents the distance term used in the integration between 0 and d.
  • 22
    • 4143124193 scopus 로고    scopus 로고
    • note
    • This measured thickness resulted from the etchant-induced removal of 7 μm from the originally 120 ± 5 μm thick sample; see part 1 (ref 6) for a detailed description of the etching process.
  • 24
    • 0000660846 scopus 로고
    • f values of this study but would preclude the operation of these samples in high level injection conditions at our light intensities and would be incompatible with the photoelectrochemical behavior reported in parts 1 and 2 of this work.
    • (1994) J. Phys. Chem. , vol.98 , pp. 2739
    • Rosenwaks, Y.1
  • 31
    • 85088620205 scopus 로고    scopus 로고
    • note
    • 2.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.