Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 393-396

  Guo, J X ^a   Tay, B K ^a   Sun, X W ^a   Ding, X Z ^a   Chua, D H C ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Diamond like carbon; Filtered cathodic vacuum arc; Tetrahedral amorphous carbon

Indexed keywords

CARBON; COATINGS; COBALT; DEPOSITION; SILICON WAFERS; STRESS ANALYSIS;

FILTERED CATHODIC VACUUM ARC (FCVA);

AMORPHOUS FILMS;

CATHODIC ARC PLASMA DEPOSITION; COATING; FILM; MECHANICAL PROPERTY; SURFACE TREATMENT;

EID: 0038807487     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00067-7     Document Type: Article

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