Field emission from heat-treated cobalt-containing amorphous carbon composite films on glass substrate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 950-953

  Li, Y J ^a   Lau, S P ^a   Tay, B K ^a   Sun, Z ^a   Chen, G Y ^a   Chen, J S ^a   Ding, X Z ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CARBON NANOTUBES; CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; COBALT; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ELECTRON SCATTERING; FIELD EMISSION DISPLAYS; FILM PREPARATION; GRAPHITIZATION; HEAT TREATMENT; LOW TEMPERATURE EFFECTS; SEMICONDUCTING GLASS; SUBSTRATES; SURFACE ROUGHNESS;

AMORPHOUS CARBON COMPOSITE FILMS; FILTERED CATHODIC VACUUM ARC TECHNIQUES (FCVA);

SEMICONDUCTING FILMS;

EID: 0035326367     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1372918     Document Type: Conference Paper

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