AFM observation of OMVPE-grown ErP on InP substrates using a new organometal tris(ethylcyclopentadienyl)erbium (Er(EtCp) 3 )

Applied Surface Science

Volumn 216, Issue 1-4 SPEC., 2003, Pages 537-541

  Akane, T ^a   Jinno, S ^b   Yang, Y ^b   Kuno, T ^b   Hirata, T ^b   Isogai, Y ^b   Watanabe, N ^b   Fujiwara, Y ^a,b   Nakamura, A ^a,b   Takeda, Y ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

AFM; Er(EtCp) 3; ErP; InP; OMVPE

Indexed keywords

ATOMIC FORCE MICROSCOPY; ERBIUM COMPOUNDS; METALLORGANIC VAPOR PHASE EPITAXY; MORPHOLOGY; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR GROWTH; SUBSTRATES; THERMAL EFFECTS;

CAPPING;

SURFACE PHENOMENA;

EID: 0038746920     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00495-1     Document Type: Conference Paper

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