High resolution maskless lithography by the integration of microoptics and point array technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4985, Issue , 2003, Pages 37-43

  Chan, Kin Foong ^a   Feng, Zhiqiang ^a   Yang, Ren ^a   Mei, Wenhui ^a  

^a Ball Semiconductor Inc   (United States)

Author keywords

Exposure; MEMS; Microlithography; Optics; Photomask; Reticle

Indexed keywords

ALGORITHMS; DATA TRANSFER; GLASS; LIGHT SOURCES; LIQUID CRYSTAL DISPLAYS; MERCURY VAPOR LAMPS; MICROOPTICS; OPTICAL INSTRUMENT LENSES; PRINTED CIRCUIT BOARDS; PROJECTION SYSTEMS; SEMICONDUCTOR LASERS; SPIN COATING;

DIGITAL MIRROR DEVICES (DMD);

LITHOGRAPHY;

EID: 0038734035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472856     Document Type: Conference Paper

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