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Volumn 4985, Issue , 2003, Pages 26-36

Design and fabrication of microlens and spatial filter array by self-alignment

Author keywords

Digital Mirror Device (DMD); Maskless lithography system (MLS); MOEMS; Pattern generator

Indexed keywords

ALIGNMENT; ARRAYS; CHIP SCALE PACKAGES; FABRICATION; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; OPTICAL DESIGN; OPTICAL FILTERS; PRINTED CIRCUIT BOARDS; SPURIOUS SIGNAL NOISE; ULTRAVIOLET RADIATION;

EID: 0038734039     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472865     Document Type: Conference Paper
Times cited : (10)

References (18)
  • 1
    • 0000266268 scopus 로고    scopus 로고
    • Low energy electron beam top surface image processing using chemically amplified AXT resist
    • C.S. Whelan, D. M. Tanenbaum, D.C. La Tulipe, M. Isaacson, "Low Energy Electron Beam Top Surface Image Processing Using Chemically Amplified AXT Resist," J. Vac. Sci. Technol. B, Vol. 15, No. 6, p2555-2560, 1997
    • (1997) J. Vac. Sci. Technol. B , vol.15 , Issue.6 , pp. 2555-2560
    • Whelan, C.S.1    Tanenbaum, D.M.2    La Tulipe, D.C.3    Isaacson, M.4
  • 2
    • 0035521912 scopus 로고    scopus 로고
    • Direct laser writing of self-developed waveguides in benzyldimethylketal-doped sol-gel hybrid glass
    • B. Bae, O. Park, R. Charters, B. Luther, G. R. Atkins, "Direct Laser Writing of Self-Developed Waveguides in Benzyldimethylketal-Doped Sol-Gel Hybrid Glass," J. Mater. Res., Vol. 16, No. 11, 2001
    • (2001) J. Mater. Res. , vol.16 , Issue.11
    • Bae, B.1    Park, O.2    Charters, R.3    Luther, B.4    Atkins, G.R.5
  • 3
    • 0038330797 scopus 로고    scopus 로고
    • Electron beam lithography system for nanometer fabrication
    • Takashi Matsuzaka, Yasunari Soda, "Electron Beam Lithography System for Nanometer Fabrication", Hitachi Review Vol. 48 (1999), No. 6, P340-343
    • (1999) Hitachi Review , vol.48 , Issue.6
    • Matsuzaka, T.1    Soda, Y.2
  • 4
    • 0038330798 scopus 로고    scopus 로고
    • Electron projection lithography uses an array-based direct-write approach to provide an economical maskless method for small-volume fabrication at the 65-nm node and below
    • P
    • Phillip Ware, "Electron projection lithography uses an array-based direct-write approach to provide an economical maskless method for small-volume fabrication at the 65-nm node and below", OE magazine, Vol.2, No. 3, P
    • OE Magazine , vol.2 , Issue.3
    • Ware, P.1
  • 5
    • 0033273528 scopus 로고    scopus 로고
    • Maskless, parrallel patterning with zone-plate array lithography
    • Nov/Dec
    • D. J. D. Carter, et al. "Maskless, parrallel patterning with zone-plate array lithography," J. Vac. Sci. Technol. B 17(6), Nov/Dec 1999, P3449-3452
    • (1999) J. Vac. Sci. Technol. B , vol.17 , Issue.6
    • Carter, D.J.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.