Characterization of spatial light modulators for micro lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4985, Issue , 2003, Pages 211-221

  Dürr, Peter ^a   Dauderstädt, Ulrike ^a   Kunze, Detlef ^a   Auvert, Marine ^a   Bakke, Thor ^a   Schenk, Harald ^a   Lakner, Hubert ^a  

^a FRAUNHOFER INSTITUTE FOR MICROELECTRONIC CIRCUITS AND SYSTEMS   (Germany)

Author keywords

DUV; Optical MEMS; Spatial Light Modulator; Uniformity of Deflection

Indexed keywords

COMPUTER SIMULATION; ELECTRIC POTENTIAL; IMAGE ANALYSIS; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

OPTICAL RESPONSES;

LIGHT MODULATION;

EID: 0038733981     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.477803     Document Type: Conference Paper

References (9)

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2. T. Sandström, A. M. Carroll, J. Z. Luberek, A. Karawajczyk: " Controlling CD variations in a massively parallel pattern generator", Optical Microlithography XV, Proceedings of SPIE Vol. #4691, (2002)
3. H. Lakner, P. Dürr, U. Dauderstädt, W. Doleschal, J. Amelung: "Design and Fabrication of Micromirror Arrays for UV-Lithography", Proceedings of SPIE Vol. 4561 (2001) 255-264
4. U. B. Ljungblad, T. Sandström, H. Buhre, P. Dürr, H. Lakner: "New architecture for laser pattern generators for 130 nanometers and beyond" Proceedings of SPIE Vol. 4186 (2000) 16-21.
5. U. B. Ljungblad, T. Sandström, H. Buhre, P. Dürr, U. Dauderstädt, H. Lakner "A new laser pattern generator for DUV using a spatial light modulator", MNE Micro- and Nano- Engineering Intern. Conf., Sept 18-21, Jena, Germany
6. T. Sandström, U. B. Ljungblad, P. Dürr, H. Lakner "High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation", Proceedings of SPIE Vol. 4343 (2001) 35, ISBN 0-8194-4029-9.
7. P. Dürr, W. Doleschal, W. Kluge, H. Lakner, T. Tanneberger, A. Wolter: "Test system for micro mirror arrays" Proceedings of SPIE Vol. 4178 (2000) 358-364.
8. rd Int. Conf. on Micro Opto Electro Mechanical Systems, Aug 30 - Sep 1, (1999), Mainz, Germany, Proceedings (1999) 60-65.
9. A. Gehner: "Development of High Resolution Spatial Light Modulators with Deformable Mirrors for Maskless Micro Lithography" (in German), (1997), Shaker Verlag, Aachen, ISBN 3-8265-2579-5.