Potential of dry etching for the fabrication of fused silica micro-optical elements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3879, Issue , 1999, Pages 63-70

  Nussbaum, Ph ^a   Weible, K J ^a   Rossi, M ^a   Herzig, H P ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; DIFFRACTION GRATINGS; FUSED SILICA; LENSES; MASKS; PHOTORESISTS; PRISMS; REACTIVE ION ETCHING; REFRACTIVE INDEX;

BLAZED GRATINGS; MICROOPTICAL ELEMENTS; MICROPRISMS; REFRACTIVE MICROLENSES;

DRY ETCHING;

EID: 0033315242     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)