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Volumn 22, Issue 2, 2001, Pages 230-234
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Fabrication of quartz microchips with optical slit and development of a linear imaging UV detector for microchip electrophoresis systems
a
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Author keywords
Linear imaging UV detector; Microchip electrophoresis; Optical slit; Quartz microchip; Signal to noise ratio
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Indexed keywords
FABRICATION;
HYDROFLUORIC ACID;
LIGHT ABSORPTION;
MICROPROCESSOR CHIPS;
SIGNAL TO NOISE RATIO;
STRAY LIGHT;
SUBSTRATES;
BONDING INTERFACES;
LINEAR IMAGING;
LINEAR IMAGING UV DETECTOR;
MICROCHIP ELECTROPHORESIS;
OPTICAL DEVELOPMENT;
OPTICAL SLIT;
QUARTZ GLASS SUBSTRATES;
QUARTZ MICROCHIP;
SYNTHESISED;
UV ABSORPTION;
QUARTZ;
HYDROFLUORIC ACID;
SILICON DIOXIDE;
CONFERENCE PAPER;
ELECTROPHORESIS;
IMAGING SYSTEM;
LINEAR SYSTEM;
MICROANALYSIS;
SIGNAL NOISE RATIO;
ULTRAVIOLET RADIATION;
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EID: 0035144335
PISSN: 01730835
EISSN: None
Source Type: Journal
DOI: 10.1002/1522-2683(200101)22:2<230::AID-ELPS230>3.0.CO;2-7 Document Type: Conference Paper |
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Times cited : (57)
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References (5)
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