Mirrors for nanofocusing x-ray beams

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4782, Issue , 2002, Pages 65-73

  Khounsary, Ali ^a   Ice, Gene E ^b   Eng, Peter ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CHICAGO   (United States)

Author keywords

Deterministic figuring; EUV; Focusing; Kirkpatrick Baez; Lithography; Mirror; Nanofocusing; X ray

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; LITHOGRAPHY; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

X RAY OPTICS;

EID: 0038641662     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.455687     Document Type: Conference Paper

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