Recrystallization of ion-beam amorphized BSCC thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 171-174

  Hishita, S ^a   Haneda, H ^a   Kim, S S ^b   Moon, J H ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b Sunchon National University   (South Korea)

^c Chonnam National University   (South Korea)

Author keywords

Amorphization; Bi 2212; Ion irradiation; Recrystallization; Superconductor; Thin film

Indexed keywords

AMORPHIZATION; CRITICAL CURRENTS; CRYSTAL GROWTH; CRYSTALLIZATION; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; PULSED LASER DEPOSITION; RAPID THERMAL ANNEALING; SEMICONDUCTING BISMUTH COMPOUNDS; SUPERCONDUCTING FILMS; THIN FILMS;

MATERIALS MODIFICATION;

HIGH ENERGY PHYSICS;

EID: 0038582300     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00715-8     Document Type: Conference Paper

References (20)

1. Maeda H., Tanaka Y., Fukutomi M., Asano T. Jpn. J. Appl. Phys. 27:1988;L209.
2. Miao H., Kitaguchi H., Kumakura H., Togano K., Hasegawa T. Physica C. 301:1998;116.
3. Wördenweber R. Supercond. Sci. Technol. 12:1999;86.
4. Satoh Y., Arisawa S., Fukuyo A., Takano Y., Ishii A., Hatano T., Togano K. Physica C. 363:2001;130.
5. Nagao M., Sato M., Maeda H. Appl. Phys. Lett. 79:2001;2612.
6. Kubota N., Sugimoto T., Shiohara Y., Tanaka S. J. Mater. Res. 8:1993;978.
7. Bove P., Rogers D.J., Teherani F.H. J. Cryst. Growth. 220:2000;68.
8. Nevriva M., Stejskal J., Leitner J., Sedmidubský D., Beran P., Strejc A. Physica C. 341-348:2000;2383.
9. Sakamoto S., Okamoto T., Saito Y. Jpn. J. Appl. Phys. 39:2000;5099.
10. Civale L., Marwick A.D., Worthington T.K., Kirk M.A., Thompson J.R., Krusin-Elbaum L., Sun Y., Clem J.R., Holtzberg F. Phys. Rev. Lett. 67:1991;648.
11. Summers G.P., Burke E.A., Chrisey D.B., Nastasi M., Tesmer J.R. Appl. Phys. Lett. 55:1989;1469.
12. Takahashi M., Nakata J., Kajiyama K. Jpn. J. Appl. Phys. 20:1981;2205.
13. Johnson S.T., Williams J.S., Nygren E. J. Appl. Phys. 64:1991;6567.
14. Oyoshi K., Hishita S., Suehara S., Aizawa T., Haneda H. Nucl. Instr. and Meth. B. 121:1997;184.
15. Hishita S., Oyoshi K., Suehara S., Aizawa T. Nucl. Instr. and Meth. B. 121:1997;157.
16. Hishita S., Oyoshi K., Suehara S., Aizawa T. Nucl. Instr. and Meth. B. 148:1999;549.
17. Hishita S., Aizawa T., Suehara S., Haneda H. Appl. Surf. Sci. 169-170:2001;296.
18. J.F. Ziegler, J.P. Biersack, SRIM ver. 2000.10, 1999.
19. Cheang-Wong J.C., Diaz-Valdes E., Jergel M., Morales A., Vargas R. Thin Solid Films. 373:2000;117.
20. Ishii A., Hatano T. Physica C. 340:2000;173.