High density plasma chemical vapor deposition of diamond-like carbon films

Microelectronics Journal

Volumn 34, Issue 5-8, 2003, Pages 627-629

  Mousinho, A P ^a   Mansano, R D ^a   Massi, M ^b   Zambom, L S ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b INSTITUTO DE ESTUDOS AVANÇADOS   (Brazil)

^c FACULDADE DE TECNOLOGIA DE SÃO PAULO   (Brazil)

Author keywords

Micromachine; Polymer micromachine; Tridimentional structures

Indexed keywords

DENSITY (SPECIFIC GRAVITY); ELECTRIC CONDUCTIVITY; HARDNESS; METHANE; MICROELECTRONICS; MICROMACHINING; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESSES;

CHEMICAL INERTNESS;

DIAMOND LIKE CARBON FILMS;

EID: 0038581556     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(03)00065-X     Document Type: Conference Paper

References (8)

1. Grill A. Diamond Relat. Mater. 8:1999;428.
2. Madov M. Fundamentals of Microfabrication. 1997;275-323.
3. Lifshitz Y. Diamond Relat. Mater. 5:1996;388.
4. Robertson J. Amorphous carbon. Adv. Phys. 35:1986;317.
5. Grill A., Meyerson B.S. Synthetic diamond: emerging CVD science and technnology. 1994;Wiley, New York. pp. 91-140.
6. Mousinho A.P., Mansano R.D., Seabra A.C. Mol. Cryst. Liq. Cryst., 375:2002;167-172.
7. Arruda A.C.S., Mousinho A.P., Mansano R.D., Raus R., Hanamoto S.L., Felisberti M.I. Mol. Cryst. Liq. Cryst., 374:2002;397-402.
8. Massi M., Mansano R.D., Maciel H.S., Otani C., Verdonck P., Nishioka N.B.N. Thin Solid Films. 343-344:1999;378.