The influence of thermal annealing in polymers employed in microelectronics

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 374, Issue , 2002, Pages 397-402

  Santos De Arruda, Antonio Carlos ^a   Mousinho, Ana Paula ^a   Mansano, Ronaldo Domingues ^a   Ruas, Ronaldo ^a   Hanamoto, Lilian Satomi ^b   Felisberti, Maria ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

^c NONE

Author keywords

MEMS; Microelectronics; Photoresist; Polymers

Indexed keywords

ADHESION; ANNEALING; DEPOSITION; DIFFERENTIAL SCANNING CALORIMETRY; ELASTIC MODULI; GLASS TRANSITION; HEAT TREATMENT; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; PHOTORESISTS; STRESSES; THERMOANALYSIS;

FILM THICKNESS; MEMS; SUBSTRATE THICKNESS; WAFER CURVATURE MEASUREMENT (WCM);

POLYMERS;

EID: 0037520732     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587250210479     Document Type: Conference Paper

References (5)

1. M. Madou, Fundamental of Microfabrication, CRC Press -New York. 1997.
2. L.F. Thompson, C.G. Wilson, M.J.Bowden, Introduction to Microlithography
3. W. M. Moreau, Semiconductor Lithography - Priciples Practices and Materials (1992)
4. V.B. F. Mathot., Calorimetry and Thermal Analyses of Polymers 1994
5. A. Schiltz, P.J. Paniez, Microeletronic Engineering (1995).