Development of sub-half micrometric structures with high aspect ratio using a multi-layer lithography e-beam process and plasma dry etching

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 374, Issue , 2002, Pages 167-172

  Mousinho, Ana Paula ^a   Mansano, Ronaldo Domingues ^a   Seabra, Antonio Carlos ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

e beam lithography; High aspect ratio structures; Nanolithography; Nanostructure; Novolac; Plasma etching

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; PHOTORESISTS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

HIGH ASPECT RATIO STRUCTURES; MICROMACHINES; MICROMETRIC STRUCTURES; NOVOLAC;

NANOSTRUCTURED MATERIALS;

EID: 0037858258     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587250210491     Document Type: Article

References (3)

1. W. B. Glendinning and J. N. Heibert. Handbook of VLSI Microlithography. Noyes Publications (1991).
2. B. Roland. Microcircuit Engineering 21:239-244 (1992).
3. D. M. Manos and D. L. Flamm. Plasma Processing. Academic Press (1990).