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Volumn 10, Issue 3-7, 2001, Pages 803-808

MPCVD diamond tool cutting-edge coverage: Dependence on the side wedge angle

Author keywords

Chemical vapour deposition (CVD); Diamond coated tools; Growth; Temperatures

Indexed keywords

DIAMOND FILMS; FINITE ELEMENT METHOD; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; TEMPERATURE DISTRIBUTION;

EID: 0035269961     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00540-9     Document Type: Article
Times cited : (24)

References (13)
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    • Bachmann P.K. Microwave plasma chemical vapor deposition of diamond. Prelas M.A., Popovici G., Bigelow L.K. Handbook of Industrial Diamonds and Diamond Films. 1988;821-850 Marcel Dekker, New York.
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    • Bachmann, P.K.1
  • 2
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  • 3
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    • Theory of diamond chemical vapor deposition
    • M.A. Prelas, G. Popovici, & L.K. Bigelow. New York: Marcel Dekker
    • Goodwin D.G., Butler J.E. Theory of diamond chemical vapor deposition. Prelas M.A., Popovici G., Bigelow L.K. Handbook of Industrial Diamonds and Diamond Films. 1988;527-581 Marcel Dekker, New York.
    • (1988) Handbook of Industrial Diamonds and Diamond Films , pp. 527-581
    • Goodwin, D.G.1    Butler, J.E.2
  • 4
    • 0343813843 scopus 로고
    • Ultrahard tool materials
    • Metals Park, Ohio, USA: ASM International
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    • (1989) Machining Metals Handbook , vol.16 , pp. 105-107
    • Heath, P.J.1
  • 8
    • 0030832375 scopus 로고    scopus 로고
    • Improvement of cutting performance of silicon nitride tool by adherent coating of thick diamond film
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    • (1997) J. Am. Ceram. Soc. , vol.80 , Issue.1 , pp. 189-196
    • Itoh, H.1    Shimura, S.2    Sugiyama, K.3    Iwahara, H.4    Sakamoto, H.5
  • 10
    • 0000411393 scopus 로고
    • Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by DC plasma-jet chemical vapour deposition
    • Peng X.L., Liu H.F., Gan Z.P., Li H.Q., Li H.D. Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by DC plasma-jet chemical vapour deposition. Diamond Relat. Mater. 4:1995;1260-1266.
    • (1995) Diamond Relat. Mater. , vol.4 , pp. 1260-1266
    • Peng, X.L.1    Liu, H.F.2    Gan, Z.P.3    Li, H.Q.4    Li, H.D.5
  • 11
    • 0032308560 scopus 로고    scopus 로고
    • Nucleation and growth of combustion flame-deposited diamond on silicon nitride
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    • (1998) Int. J. Refract. Metals Hard Mater. , vol.16 , pp. 377-388
    • Rozbicki, R.T.1    Sarin, V.K.2
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    • Review: Relationships between processing, microstructure and properties of dense and reaction-bonded silicon nitride
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    • (1987) J. Mater. Sci. , vol.22 , pp. 3041-3086
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  • 13
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    • Morphological phenomena of CVD diamond
    • San Diego, California: The International Society for Optical Engineering
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    • (1990) Diamond Optics III Proceedings of the SPIE , vol.1325 , pp. 187-201
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.