MPCVD diamond tool cutting-edge coverage: Dependence on the side wedge angle

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 803-808

  Fernandes, A J S ^a   Silva, V A ^a   Carrapichano, J M ^a   Dias, G R ^b   Silva, R F ^a   Costa, F M ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

Author keywords

Chemical vapour deposition (CVD); Diamond coated tools; Growth; Temperatures

Indexed keywords

DIAMOND FILMS; FINITE ELEMENT METHOD; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; TEMPERATURE DISTRIBUTION;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND CUTTING TOOLS;

CUTTING TOOL; DIAMOND COATING; FINITE ELEMENT METHOD; TEMPERATURE DISTRIBUTION; VAPOR DEPOSITION;

EID: 0035269961     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00540-9     Document Type: Article

References (13)

1. Bachmann P.K. Microwave plasma chemical vapor deposition of diamond. Prelas M.A., Popovici G., Bigelow L.K. Handbook of Industrial Diamonds and Diamond Films. 1988;821-850 Marcel Dekker, New York.
2. Butler J.E., Windischmann H. Developments in CVD-diamond synthesis during the past decade. Mater. Res. Soc. Bull. 23:(9):1998;22-27.
3. Goodwin D.G., Butler J.E. Theory of diamond chemical vapor deposition. Prelas M.A., Popovici G., Bigelow L.K. Handbook of Industrial Diamonds and Diamond Films. 1988;527-581 Marcel Dekker, New York.
4. Heath P.J. Ultrahard tool materials. Machining. Metals Handbook. 16:1989;105-107 ASM International, Metals Park, Ohio, USA.
5. 4 substrates. Diamond Relat. Mater. 9:2000;483-488.
6. 4 composition and mechanical/chemical pre-treatments on the adhesion strength of MPCVD diamond films, in: Proceedings of the International Conference on Mass and Charge Transport in Inorganic Materials - Fundamentals to Devices, Venice, Italy, 28 May-2 June, 2000, in press.
7. Buchkremer-Hermanns H., Ren H., Kohlschein G., Weiss H. Nucleation and early growth of CVD diamond on silicon nitride. Surf. Coat. Technol. 98:1998;1038-1046.
8. Itoh H., Shimura S., Sugiyama K., Iwahara H., Sakamoto H. Improvement of cutting performance of silicon nitride tool by adherent coating of thick diamond film. J. Am. Ceram. Soc. 80:(1):1997;189-196.
9. Chen K.H., Lai Y.L., Lin J.C., Song K.J., Chen L.C., Huang C.Y. Micro-Raman for diamond film stress analysis. Diamond Relat. Mater. 4:1995;460-463.
10. Peng X.L., Liu H.F., Gan Z.P., Li H.Q., Li H.D. Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by DC plasma-jet chemical vapour deposition. Diamond Relat. Mater. 4:1995;1260-1266.
11. Rozbicki R.T., Sarin V.K. Nucleation and growth of combustion flame-deposited diamond on silicon nitride. Int. J. Refract. Metals Hard Mater. 16:1998;377-388.
12. Ziegler G., Heinrich J., Wotting G. Review: relationships between processing, microstructure and properties of dense and reaction-bonded silicon nitride. J. Mater. Sci. 22:1987;3041-3086.
13. Zhu W., Badzian A.R., Messier R. Morphological phenomena of CVD diamond. Diamond Optics III. Proceedings of the SPIE. 1325:1990;187-201 The International Society for Optical Engineering, San Diego, California.