Preparation of n-i-p solar cells entirely by HWCVD with microcrystalline p-layer

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 236-239

  Kupich, Markus ^a   Kumar, Prabhat ^a   Schröder, Bernd ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

Amorphous silicon; Hot wire CVD; Microcrystalline silicon; Solar cells

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; GROWTH (MATERIALS); INTERFACES (MATERIALS); SHORT CIRCUIT CURRENTS;

MICROCRYSTALLINE SILICON;

SOLAR CELLS;

EID: 0038485858     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00133-0     Document Type: Conference Paper

References (7)

1. Q. Wang, E. Iwaniczko, Y. Xu, B.P. Nelson, A.H. Mahan, R.S. Crandall, H.M. Branz, in: Proceedings of the 28th IEEE Photovoltaics Specialists Conference, Anchorage, USA, September 15-22, 2000, 717.
2. Mahan A.H., Gedvillas L.M., Webb J.D. J. Appl. Phys. 87:(4):2000;1650.
3. U. Weber, M. Koob, R.O. Dusane, C. Mukherjee, H. Seitz, B. Schröder, in: Proceedings of the 16th European Photovoltaic Solar Energy Conference, Glasgow, UK, May 1-5, 2000, 115.
4. Mukherjee C., Weber U., Seitz H., Schröder B. Thin Solid Films. 395:2001;310.
5. Aspnes D.E., Theeten J.B. Phys. Rev. B. 27:(2):1983;985.
6. Jellison G.E. Jr., Chisholm M.F., Gorbatkin S.M. Appl. Phys. Lett. 62:(25):1993;3348.
7. S. Klein, F. Finger, R. Carius, O. Kluth, L.B. Neto, H. Wagner, M. Stutzmann, in: B. McNelis, W. Palz, H.A. Ossenbrink, P. Helm (Eds.), Proceedings of the 17th European Photovoltaic Solar Energy Conference, Munich, Germany, October 22-26, 2001, 2965.